Modelling of sputtering yield amplification in serial reactive magnetron co-sputtering

Amsterdam / Elsevier, [u.a.] (2012) [Journal Article]

Surface & coatings technology
Volume: 206
Issue: 24
Page(s): 5055-5059

Authors

Selected Authors

Kubart, T.
Schmidt, Rüdiger Matti
Austgen, Michael
Nyberg, T.
Pflug, A.

Other Authors

Siemers, M.
Wuttig, Matthias
Berg, S.

Identifier