Sputter yield amplification by tungsten doping of Al(2)O(3) employing reactive serial co-sputtering: process characteristics and resulting film properties

Bristol / IOP Publ. (2011) [Journal Article]

Journal of physics / D, Applied physics
Volume: 44
Issue: 34
Page(s): 345501

Authors

Selected Authors

Austgen, Michael
Köhl, Dominik
Zalden, Peter Erhard
Kubart, Thomas
Nyberg, Tomas

Other Authors

Pflug, Andreas
Siemers, M.
Berg, S.
Wuttig, Matthias

Identifier