Modelling of sputtering yield amplification effect in reactive deposition of oxides

Lausanne / Elsevier Sequoia (2010) [Journal Article]

Surface & coatings technology
Volume: 204
Issue: 23
Page(s): 3882-3886

Authors

Selected Authors

Kubart, Tomas
Nyberg, T.
Pflug, Andreas
Siemers, M.
Austgen, Michael

Other Authors

Köhl, Dominik
Wuttig, Matthias
Berg, S.

Identifier