Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides

Melville, N.Y / American Institute of Physics (2006) [Journal Article]

Applied physics letters
Volume: 88
Issue: 16
Page(s): 161504

Authors

Selected Authors

Severin, Daniel
Kappertz, Oliver
Kubart, Thomas
Nyberg, Tomas
Berg, S.

Other Authors

Pflug, Andreas
Siemers, M.
Wuttig, Matthias

Identifier