Temperature stability of sputtered niobium oxide films

Melville, NY / AIP (2002) [Journal Article]

Journal of applied physics
Volume: 91
Page(s): 4863-4863

Authors

Selected Authors

Venkataraj, S.
Drese, Robert Jens
Liesch, C.
Kappertz, Oliver
Jayavel, R.

Other Authors

Wuttig, Matthias

Identifier