Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide

Lausanne / Elsevier Sequoia (2008) [Journal Article]

Surface & coatings technology
Volume: 202
Issue: 20
Page(s): 5033-5035

Authors

Selected Authors

Sarakinos, Kostas
Alami, Jones
Klever, Christian
Wuttig, Matthias

Identifier