Please find the list of publcations of Professor Dr. Wuttig's sputter deposition-group below:

• A. Amin, D. Köhl, M. Wuttig
  The role of energetic ion bombardment during growth of TiO₂ thin films by reactive sputtering
  J. of Physics D: Appl. Physics, 43, 405303 (2010)
  link to Article

• J. Okumu, D. Köhl, A. Sprafke, G. von Plessen, M. Wuttig
  Formation mechanism of noble metal nanoparticles in reactively sputtered TiO₂ films
  J. of Appl. Physics, 108, 063529 (2010)
  link to Article
  
  
• T. Kubart, T. Nyberg, A. Pflug, M. Siemers, M. Austgen, D. Köhl, M. Wuttig, S. Berg
  Modelling of sputtering yield amplification effect in reactive deposition of oxides
  Surfaces & Coatings Technology, 3882 (2010)
  link to Article
  

• D. Köhl, M. Luysberg, M. Wuttig
  Structural improvement of zinc oxide films produced by ion beam assisted reactive sputtering
  J. Phys. D: Appl. Phys. 43, 205301 (2010)
  link to Article

• D. Köhl, M. Luysberg, M. Wuttig
  Highly textured zinc oxide films by room temperature ion beam assisted deposition
  Phys. Status Solidi RRL 3, 236 (2009)
  link to Article

• D. Severin, O. Kappertz, T. Nyberg, S. Berg, A. Pflug, M. Wuttig
  Increase of the deposition rate in reactive sputtering of metal oxides using a ceramic nitride target
  J. Applied Physics 105, 093302 (2009)
  link to Article
  
  
• J. Alami, K. Sarakinos, F. Uslu, C. Klever, J. Dukwen, M. Wuttig
  On the phase formation of titanium oxide films grown by reactive high power pulsed magnetron sputtering
  J. of Physics D: Applied Physics 42, 115204 (2009)
  link to Article
  

• J. Alami, K. Sarakinos, F. Uslu, M. Wuttig
  On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering
  J. of Physics D: Applied Physics 42, 015304 (2009)
  link to Article

• K. Sarakinos, J. Alami, C. Klever, M. Wuttig:
  Process stabilization and enhancement of deposition rate during reactive high power pulsed magnetron sputtering of zirconium oxide
  Surface Coatings and Technology 202, 5033 (2008)
  link to Article
  
  
• D. Severin, K. Sarakinos, O. Kappertz, A. Pflug, and M. Wuttig:
  Tailoring of structure formation and phase composition in reactively sputtered zirconium oxide films using nitrogen as an additional reactive gas
  J. Appl. Phys. 103, 083306(2008)
  link to Article

• K. Sarakinos, J. Alami, P.M. Karimi, D. Severin, M. Wuttig:
  The role of backscattered energetic atoms in film growth in reactive magnetron sputtering of chromium nitride
  J. Appl. Phys. 40, 778 (2007)
  Link to Article
  
  
• K. Sarakinos, J. Alami, C. Klever, M. Wuttig:
  Growth of TiO_x films by high power pulsed magnetron sputtering from a compound TiO_1.8 target
  Rev. Adv. Mater. Sci. 15, 44 (2007)
  

• K. Sarakinos, J. Alami, M. Wuttig:
  "Process characteristics and film properties upon growth of TiOx films by high power pulsed magnetron sputtering"
  J. Phys. D: Appl. Phys., Vol. 40, p. 2108 (2007)
  link to Article


• D. Severin, O. Kappertz, T. Nyberg, S. Berg, M. Wuttig:
  "The effect of target aging on the structure formation of zinc oxide during reactive sputtering"
  Thin Solid Films, Vol. 515, p. 3554 (2007)
  link to Article

• S. Venkataraj, D. Severin, S.H. Mohamed, J. Ngaruiya, O. Kappertz, M. Wuttig:
  "Towards understanding the superior properties of transition metal oxynitrides prepared by reactive DC magnetron sputtering"
  Thin Solid Films, Vol. 502 , p. 228 (2006)
  link to Article
  
  
• S. Venkataraj, D. Severin, R. Drese, F. Koerfer, M. Wuttig:
  "Structural, optical and mechanical properties of aluminium nitride films prepared by reactive DC magnetron sputtering"
  Thin Solid Films, Vol. 502 , p. 235 (2006)
  link to Article
  
  
• D. Severin, O. Kappertz, T. Kubart, t. Nyberg, S. Berg, A. Pflug, M. Simers, M. Wuttig:
  "Process stabilization and increase of the deposition rate in reactive sputtering of metal oxides and oxynitrides"
  Applied Physics Letters, Vol. 88 , p. 161504 (2006)
  link to Article
  
  
• J. Hüpkes, B. Rech, S. Calnan, O. Kluth, U. Zastrow, H. Siekmann, M. Wuttig:
  "Material study on reactively sputtered zinc oxide for thin-film silicon solar cells"
  Thin Solid Films, Vol. 502 , p. 286 (2006)
  link to Article
  
  
• R. Drese, M. Wuttig:
  "In situ stress measurements in zirconium and zirconium oxide films prepared by direct-current sputtering"
  J. Applied Physics, Vol. 99 , p. 123517 (2006)
  link to Article
  
  
• S. Venkataraj, H. Kittur, R. Drese, M. Wuttig:
  "Multi-technique characterization of tantalum oxinitride films prepared by reactive DC magnetron sputtering"
  Thin Solid Films, Vol. 514 , p. 1 (2006)
  link to Article
  
  
• J. Alami, K. Sarakinos, G. Mark, M. Wuttig:
  "On the deposition rate in a high power pulsed magnetron sputtering discharge"
  applied Physics Letters, Vol. 89 , p. 154104 (2006)
  link to Article
  
  
• J. Hüpkes, B. Rech, O. Kluth, T. Repmann, B. Zwaygardt, J. Müller, R. Drese, M. Wuttig:
  "Surface-textured MR-sputtered ZnO films for microcrystalline silicon-based thin-film solar cells"
  Solar Energy Materials and Solar Cells, Vol. 90 , p. 3054 (2006)
  link to Article
  
  
• C. Salinga, O. Kappertz, M. Wuttig:
  "Reactive direct current magnetron sputtering of tungsten oxide : a correlation between film properties and deposition pressure"
  Thin Solid Films, Vol. 515 , p. 2760 (2006)
  link to Article
  
  
• C. Salinga, O. Kappertz, M. Wuttig:
  "Gasochromic switching of reactively sputtered molybdenum films: A correlation between film properties and deposition pressure"
  Thin Solid Films, Vol. 515 , p. 1327 (2006)
  link to Article
  
  
• J. Okumu, F. Körfer, C. Salinga, T.P. Pedersen, M. Wuttig:
  "Gasochromic switching of reactively sputtered molybdenumoxide films : a correlation between film properties and deposition pressure "
  Thin Solid Films, Vol. 515 , p. 1327 (2006)
  link to Article
  
  
• J. Okumu, C. Dahmen, A.N. Sprafke, M. Luysberg, G. von Plessen, M. Wuttig:
  "Photochromic silver nanoparticles fabricated by sputter deposition"
  J. Applied Physics, Vol. 97 , p. 94305 (2005)
  link to Article
  
  
• O. Kappertz, R. Drese, M. Wuttig:
  "Reactive sputter deposition of zinc oxide: Employing resputtering effects"
  Thin Solid Films, Vol. 484 , p. 64 (2005)
  link to Article
  
  
• R. Drese, M. Wuttig:
  "Stress evolution during growth in direct-current sputtered zinc oxide films at various flows"
  J. Appl. Physics, Vol. 98 , p. 73514 (2005)
  link to Article
  
  
• S. H. Mohamed, O. Kappertz, J. Ngaruiya, T. Niemeier, R. Drese, R. Detemple, M. Wakkad, M. Wuttig:
  "Influence of nitrogen content of direct current sputtered TiOxNy films"
  Physica Status Solidi, Vol. (a) 201 , p. 90 (2004)
  link to Article
  
  
• J. M. Ngaruiya, O. Kappertz, C. Liesch, P. Müller, R. Dronskowski, M. Wuttig:
  "Composition and formation mechanism of zirconium oxynitride films produced by reactive magnetron sputtering"
  Physica Status Solidi, Vol. (a) 201 , p. 967 (2004)
  link to Article
  
  
• C. Agashe, O. Kluth, J. Hüpkes, U. Zastrow, B. Rech, M. Wuttig:
  "Efforts to improve carrier mobility in RF sputtered ZnO:Al films"
  J. Applied Physics, Vol. 95 , p. 1911 (2004)
  link to Article
  
  
• J. Okumu, F. Koerfer, C. Salinga, M. Wuttig:
  "In-situ measurements of thickness changes and mechanical stress upon gasochromic switching of thin MoOx films"
  J. Applied Physics, Vol. 95 , p. 7632 (2004)
  link to Article
  
  
• S. Venkataraj, O. Kappertz, Ch. Liesch, R. Detemple, R. Jayavel, M. Wuttig:
  "Thermal stability of sputtered zirconium oxide films "
  Vacuum, Vol. 75 , p. 7 (2004)
  link to Article
  
  
• J. M. Ngaruiya, O. Kappertz, S.H. Mohamed, M. Wuttig:
  "Structure formation upon reactive DC sputtering of transition metal oxides"
  Applied Physics Letters, Vol. 85 , p. 748 (2004)
  link to Article
  
  
• T.L. Pedersen, C. Liesch, C. Salinga, T. Eleftheriades, M. Wuttig:
  "Hydrogen induced changes of mechanical stress and optical transmission in thin Pd films"
  Thin Solid Films, Vol. 458 , p. 299 (2004)
  link to Article
  
  
• S. H. Mohamed, O. Kappertz, T. Niemeier, R. Drese, M. Wakkad, M. Wuttig:
  "Effect of heat treatment on structural, optical and mechanical properties of sputtered TiOxNy films"
  Thin Solid Films, Vol. 468 , p. 48 (2004)
  link to Article
  
  
• W. Kalb, P. Lang, M. Mottaghi, H. Aubin, G. Horrowitz, M. Wuttig:
  "Structure-performance relationship in pentacene/Al2O3 thin-film transistors"
  Synthetic Metals, Vol. 146 , p. 279 (2004)
  link to Article
  
  
• S. H. Mohamed, O. Kappertz, J. M. Ngaruiya, T.P. Pedersen, R. Drese, M. Wuttig:
  "Correlation between structure, stress and optical properties in direct current sputtered molybdenum oxide films"
  Thin Solid Films, Vol. 429 , p. 135 (2003)
  link to Article
  
  
• J. M. Ngaruiya, S. Venkataraj, R. Drese, O. Kappertz, T.P. Pedersen, M. Wuttig:
  "Preparation and characterization of tantalum oxide films produced by reactive DC magnetron sputtering"
  Physica Status Solidi, Vol. 198 , p. 99 (2003)
  link to Article
  
  
• T.P. Pedersen, C. Salinga, H. Weis, M. Wuttig:
  "Mechanical stresses upon hydrogen induced optical switching of thin films"
  Journal of Applied Physics, Vol. 93 , p. 6034 (2003)
  link to Article
  
  
• S. H. Mohamed, O. Kappertz, T.P. Pedersen, R. Drese, M. Wuttig:
  "Properties of TiOx coatings prepared by dc magnetron sputtering"
  Physica Status Solidi, Vol. 193 , p. 224 (2003)
  
  
• S. Venkataraj, R. Drese, Ch. Liesch, O. Kappertz, R. Jayavel, M. Wuttig:
  "Temperature stability of sputtered niobium oxide films"
  J. Appl. Physics, Vol. 91 , p. 4863 (2002)
  link to Article
  
  
• C. Salinga, H. Weis M. Wuttig:
  "Gasochromic switching of Tungsten Oxide Films: a correlation between film properties and coloration kinetics"
  Thin Solid Films, Vol. 414 , p. 288 (2002)
  link to Article
  
  
• O. Kappertz, R. Drese, M. Wuttig:
  "Correlation between structure, stress and depositions parameters in DC-sputtered zinc oxide films"
  J. Vac. Sci. Technol. A, Vol. 20 , p. 2084 (2002)
  link to Article
  
  
• S. Venkataraj, R. Drese, Ch.Liesch, O. Kappertz, R. Jayavel, M. Wuttig:
  "Thermal stability of lead oxide films prepared by reactive DC magnetron sputtering"
  Physica status solidi (a), Vol. 194 , p. 192 (2002)
  link to Article
  
  
• S. Venkataraj, O. Kappertz, R. Jayavel, M. Wuttig:
  "Growth and characterization of zirconium oxinitride films prepared by reactive direct current magnetron sputtering"
  J. Appl. Physics, Vol. 92 , p. 2461 (2002)
  link to Article
  
  
• S. Venkataraj, O. Kappertz, Hj. Weis, R. Drese, R. Jayavel, M. Wuttig:
  "Structural and optical properties of thin zirconium oxynitride films prepared by reactive direct current magnetron sputtering"
  J. Appl. Physics, Vol. 92 , p. 3599 (2002)
  link to Article
  
  
• D. Kurapov, D. Neuschütz, R. Cremer, T. Pedersen, M. Wuttig, D. Dietrich, G. Marx, J.M. Schneider:
  "Synthesis and mechanical properties of BCN coatings deposited by PECVD"
  Vacuum, Vol. 68 , p. 335 (2002)
  link to Article
  
  
• H.-W. Wöltgens, I. Friedrich, W. Njoroge, W. Theiss und M. Wuttig:
  "Optical, electrical and structural properties of Al-Ti and Al-Cr thin films"
  Thin Solid Films, Vol. 388 , p. 237 (2001)
  link to Article
  
  
• S. Venkataraj, H. Weis, O. Kappertz, W. Njoroge, R. Jayavel, M. Wuttig:
  "Structural and optical properties of thin lead oxide films produced by reactive DC magnetron sputtering"
  J. Vac. Sci. Technol. A, Vol. 19 , p. 2870 (2001)
  link to Article
  
  
• S. Venkataraj, R. Drese, O. Kappertz, R. Jayavel, M. Wuttig:
  "Characterization of niobium oxide films prepared by reactive DC magnetron sputtering"
  Physica status solidi (a), Vol. 188 , p. 1047 (2001)
  link to Article
  
  
• W. Njoroge, T. Lange, H. Weis, B. Kohnen und M. Wuttig:
  "Defect formation upon reactive DC magnetron sputtering of GeO₂ films"
  J. Vac. Sci. and Technol. A, Vol. 18 , p. 42 (2000)
  link to Article
  
  
• T. Lange, W. Njoroge, H. Weis, M. Beckers und M. Wuttig:
  "Physical Properties of thin GeO2 films produced by reactive DC sputtering"
  Thin Solid Films, Vol. 365 , p. 82 (2000)
  link to Article